Effect of detector photoelectric features on ptychography

An analytical solution model for ptychography was proposed. In this model, can be described as a system of linear equations between the sample[<i>O</i>(<i>u</i>)] and illumination[<i>P</i>(<i>u</i>)] in frequency domain. This equations(<i>AX</i>=<i>B</i>) are derived with spectrum illumination coefficient(<i>A</i>), sample unknown(<i>X</i>), intensity diffraction pattern vector(<i>B</i>). Hence, recovered by solving system. ptychography, detector (such Pike F-100, AVT) has large resolution, meaning that 1000×1000 generated recording single pattern. It is still case, however, number obtained smaller than unknowns, leading to inability obtain unique about sample. Relative translation illumination, generate more patterns construct sufficient independent equations. For since initial known, [<i>P<sub>n</sub></i>(<i>u</i>)=<i>P</i>(<i>u</i>)exp(<i>iφ</i>)] after its distance. Hence directly provided solve Simultaneously, optoelectronic features have significant impact on imaging quality ptychography. Using system, photoelectric characterized unknowns each equation. According conditions existence equations, requirements pixel sampling interval, width target surface, size, sensitivity dynamic range), impacts reconstruction been theoretically quantified. Obviously, results numerical simulations, based theory, not only verify correctness theoretical analysis predictions, but also derive physical mechanism recovering high-quality imperfect detector, which contribute improving their optimizing experimental setup.